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A1000PC

A1000PC is a Atomic layer deposition system for large-scale industrial production. Low temperature coating design can deposit high-quality optical films on various 3D substrates.

Overview

A1000PC is a Atomic layer deposition system for large-scale industrial production. Low temperature coating design can deposit high-quality optical films on various 3D substrates.

Excellent film shape retention and adhesion on plastic substrates

Design of ALD system certified through industrial testing

Best-in-class uptime and capacity

Compatible with automated loading of substrates

Advanced Control Systems for Industry 4.0

Related parameters

Size Width 3220, length 4300, height 2800mm (also customizable) Deposited film Al2O3,SiO2,TiO2 Plasma ICP
Precursor source 4 liquid 2 gas Substrate Planar or three-dimensional Loading capacity Φ335mm*40pcs
Process temperature <130℃ Film uniformity Al2O3,SiO2 <±2%, TiO2<±3% Loading method Semi-automatic

Feature and advantage

Product Features

Excellent film shape retention and adhesion on plastic substrates

Design of ALD system certified through industrial testing

Best-in-class uptime and capacity

Compatible with automated loading of substrates

Advanced Control Systems for Industry 4.0

Real batch low-temperature silicon oxide deposition process

Excellent batch titanium dioxide uniformity

Can perform plasma pre-treatment on plastic lenses

High loading batch Atomic layer deposition system

Industry leading mass production equipment

Verified High Repetitive Reliability

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