The miniaturized layout design of A800LS allows maintenance and other operations to be carried out in the gray area, saving clean room space. The corresponding maintenance operations are simpler, with fewer consumables used, meeting the high repeatability and high reliability coating requirements for industrialization.
The miniaturized layout design of A800LS allows maintenance and other operations to be carried out in the gray area, saving clean room space. The corresponding maintenance operations are simpler, with fewer consumables used, meeting the high repeatability and high reliability coating requirements for industrialization.
Industrialized design for the LED industry, compatible with various sizes of wafers
Advanced PLC control system compatible with Industry 4.0
High accuracy process control
Shorter ALD cycle time and less precursor source consumption
Highest production, lowest production consumption
Optimal film uniformity and repeatability
4/6-inch standard wafer can hold up to 150/50 chips
70℃ – 300℃
Al2O3 film: standard configuration for aluminum source and water source location, optional with precursor sources such as ozone
Large loading capacity and short coating time
Better than 1.0% film uniformity(1σ, 5mmEE).
Highly competitive equipment performance and film uniformity
Conformal coverage ＞94%
Continuous non pinhole alumina barrier film with superior water vapor barrier can greatly improve the lifespan of Mini LED; And the thin film has high breakdown voltage performance
Emi level high-precision film thickness controllability and high production reliability
Manual loading
Semi-automatic loading
Fully automatic loading
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